Structural properties of sputter-deposited nanocrystalline Ni thin films

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dc.contributor.authorDanışman, Murat
dc.date.accessioned2024-06-13T20:18:22Z
dc.date.available2024-06-13T20:18:22Z
dc.date.issued2022
dc.departmentFakülteler, Mühendislik Fakültesi, Metalurji ve Malzeme Mühendisliği Bölümü
dc.description.abstractFor this study, Ni thin films were deposited on a glass substrate by using 200, 300, and 400 W direct-current magnetron sputtering method for observing the effect of sputtering power on the structural properties of thin films. Grain size, crystallinity, orientation, and texture of the deposited thin films were observed and evaluated by X-ray diffraction (XRD) analysis. According to XRD analysis, all thin films presented crystalline atomic structure. Furthermore, the effect of texture on the structural properties were observed using strain analysis and grain sizes that were calculated by Scherrer's method and Williamson-Hall analysis. The analysis revealed that the grain size of sputter-deposited thin films increased linearly with respect to the increasing sputtering power. Additionally, the elastic modulus and indentation hardness of the samples were measured by nanoindentation method, and the results were evaluated in terms of grain size and texture. The highest grain size, 7.30 nm, was observed on a 400 W sputter-deposited sample, which also had the highest elastic modulus and indentation hardness values as 98 and 3.6 GPa, respectively.
dc.identifier.doi10.1515/mt-2022-0039
dc.identifier.endpage1277
dc.identifier.issn0025-5300
dc.identifier.issn2195-8572
dc.identifier.issue9
dc.identifier.scopus2-s2.0-85138469731
dc.identifier.scopusqualityQ2
dc.identifier.startpage1270
dc.identifier.urihttps://doi.org/10.1515/mt-2022-0039
dc.identifier.urihttps://hdl.handle.net/11501/1352
dc.identifier.volume64
dc.identifier.wosWOS:000851268300003
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.institutionauthorDanışman, Murat
dc.institutionauthorid0000-0003-2978-6054
dc.language.isoen
dc.publisherWalter de Gruyter GmbH
dc.relation.ispartofMaterials Testing
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectNanocrystalline Thin Films
dc.subjectNanoindentation
dc.subjectSputter Deposition
dc.subjectTexture Coefficient
dc.subjectThin Film Ni
dc.titleStructural properties of sputter-deposited nanocrystalline Ni thin films
dc.typeArticle

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