Crystallization of TiO2 on sputter deposited amorphous titanium thin films

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dc.contributor.authorTepe, Seda Aysel
dc.contributor.authorDanışman, Murat
dc.contributor.authorCansever, Nurhan
dc.date.accessioned2024-06-13T20:18:02Z
dc.date.available2024-06-13T20:18:02Z
dc.date.issued2022
dc.departmentFakülteler, Mühendislik Fakültesi, Metalurji ve Malzeme Mühendisliği Bölümü
dc.description.abstractTitanium and titanium dioxide are both very well-known and commonly used materials in today's world. They would also be very promising materials for years to come as their more novel properties are continued to be investigated. For meeting the demands of today's technology and to fine tune its properties, titanium dioxide is still in the scope of scientists from different branches of science. In our study, sputter deposited amorphous titanium thin films on glass substrates were anodically oxidized at 0.7 V for 250, 750, 1250 s in 0.5 M H2SO4 solution to observe their crystalline structure and electrochemical properties. X ray diffraction analysis revealed rutile and anatase crystalline peaks on 250 s and 1250 s anodized samples. Additionally, electrochemical impedance spectroscopy and atomic force microscopy analysis were carried out for investigating the effect of anodization on electrochemical and surface properties of amorphous titanium thin films. Both analysis showed compressive stress related findings in oxide films due to crystallization process.
dc.identifier.doi10.1016/j.matchemphys.2022.125965
dc.identifier.issn0254-0584
dc.identifier.issn1879-3312
dc.identifier.scopus2-s2.0-85125877816
dc.identifier.scopusqualityQ1
dc.identifier.urihttps://doi.org/10.1016/j.matchemphys.2022.125965
dc.identifier.urihttps://hdl.handle.net/11501/1188
dc.identifier.volume282
dc.identifier.wosWOS:000913143700001
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.institutionauthorDanışman, Murat
dc.language.isoen
dc.publisherElsevier Science Sa
dc.relation.ispartofMaterials Chemistry and Physics
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectAmorphous Titanium
dc.subjectThin Films
dc.subjectAnodization
dc.subjectImpedance Spectroscopy
dc.titleCrystallization of TiO2 on sputter deposited amorphous titanium thin films
dc.typeArticle

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